High Purity Alloy Tungsten Sputtering Target For Thin Film Industry

High Purity Tungsten Sputtering Target for Thin Film Industry

Tungsten Sputtering Targets has the highest melting point (3422℃, 6192 ℉) of all metals in pure form. It has the lowest vapor pressure (at temperatures above 1650℃, 3000 ℉) and the highest tensile strength.

Tungsten Sputtering Targets Information

Tungsten Sputtering Targets
Purity: 99.95%;

Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040''
Block: Length ≤ 32 inch, Width ≤ 12 inch, Thickness ≥ 1mm.

Tungsten Sputtering Targets Picture:

Tungsten has the highest melting point (3422℃, 6192 ℉) of all metals in pure form. It has the lowest vapor pressure (at temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Although Carbon remains stable at higher temperatures than tungsten, Carbon sublimes at atmospheric pressure instead of melting, so it has no melting point. Tungsten has the lowest coefficient of thermal expansion of any pure metal. The low thermal expansion and high melting point, and tensile strength of tungsten originate from strong covalent bonds formed between tungsten atoms by the 5d electrons. Alloying small quantities of tungsten with steel dramatically increases its toughness.

Alloy Tungsten Sputtering Target

Thin Film Industry Tungsten Sputtering Target

High Purity Alloy Tungsten Sputtering Target

High Purity Alloy Tungsten Sputtering Target For Thin Film Industry Images